Wonik IPS Co Ltd
KOSDAQ:240810
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P/OCF
Price to Operating Cash Flow (P/OCF) ratio compares a company`s market value to the cash it generates from its core operations.
Price to Operating Cash Flow (P/OCF) ratio compares a company`s market value to the cash it generates from its core operations.
Valuation Scenarios
If P/OCF returns to its 3-Year Average (21.1), the stock would be worth ₩67 900.01 (45% downside from current price).
| Scenario | P/OCF Value | Implied Price | Upside/Downside |
|---|---|---|---|
| Current Multiple | 38.5 | ₩123 900 |
0%
|
| 3-Year Average | 21.1 | ₩67 900.01 |
-45%
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| 5-Year Average | 19.2 | ₩61 796.78 |
-50%
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| Industry Average | 18.3 | ₩58 844.11 |
-53%
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| Country Average | 9 | ₩28 923.67 |
-77%
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Forward P/OCF
Today’s price vs future operating cash flow
Peer Comparison
| Market Cap | P/OCF | P/E | ||||
|---|---|---|---|---|---|---|
| KR |
W
|
Wonik IPS Co Ltd
KOSDAQ:240810
|
6T KRW | 38.5 | 71.7 | |
| NL |
|
ASML Holding NV
AEX:ASML
|
476.8B EUR | 34.9 | 47.3 | |
| US |
|
Lam Research Corp
NASDAQ:LRCX
|
323.3B USD | 45.4 | 52 | |
| US |
|
Applied Materials Inc
NASDAQ:AMAT
|
312.9B USD | 35.9 | 39.9 | |
| US |
B
|
Brooks Automation Inc
LSE:0HQ1
|
235.4B USD | 3 772.1 | -4 068.5 | |
| US |
|
KLA Corp
NASDAQ:KLAC
|
234.1B USD | 49.1 | 51.4 | |
| JP |
|
Tokyo Electron Ltd
TSE:8035
|
20.9T JPY | 41.7 | 41.5 | |
| JP |
|
Advantest Corp
TSE:6857
|
20.3T JPY | 60.6 | 70.2 | |
| US |
|
Teradyne Inc
NASDAQ:TER
|
59.3B USD | 87.9 | 107 | |
| JP |
|
Disco Corp
TSE:6146
|
8.1T JPY | 81.9 | 61.8 | |
| CN |
|
NAURA Technology Group Co Ltd
SZSE:002371
|
326.3B CNY | 153 | 59.1 |
Market Distribution
| Min | 0.2 |
| 30th Percentile | 4.2 |
| Median | 9 |
| 70th Percentile | 16.6 |
| Max | 2 215 132.4 |
Other Multiples
Wonik IPS Co Ltd
Glance View
WONIK IPS CO., LTD. engages in the manufacture and distribution of semiconductor and display semiconductor machineries. The company is headquartered in Pyeongtaek, Gyeonggi-Do. The company went IPO on 2016-05-02. The firm's main products include plasma enhanced chemical vapor deposition (PECVD), ALD, diffusion thermal systems, dry etchers, low temperature poly silicon (LTPS) furnaces, pi curing, radar interface equipment (RIE) etchers. In addition, the Company sells parts necessary for equipment and device maintenance, and provides technical services.
